Plasma-assisted chemical vapor deposition (PACVD) process: how does it work?

The set-up for this process is similar to that for sputtering, which is frequently used in combination with CVD. In PACVD a gas containing the coating elements is introduced into the vacuum chamber and a discharge powered by an AC voltage is ignited.
This creates free carbon and hydrogen atoms (ions and radicals) that form a dense coating on the tools and components. Coating properties can be influenced by varying the applied voltage.
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