Plasma Enhanced Chemical Vapor Deposition (PECVD) | Centre for Nanotechnology | IIT Guwahati

Plasma Enhanced Chemical Vapor Deposition (PECVD) demonstrated by Dr. Rajan Singh, Associate Project Engineer, Indian Nanoelectronics Users’ Programme - Idea to Innovation (INUP-i2i)
For more details:
www.inup-i2i.in/
www.inup-i2i.org/
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Centre for Nanotechnology, IIT Guwahati
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