TRUMPF EUV lithography - This all happens in one second
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- Опубліковано 5 лют 2019
- Further information: www.trumpf.com/s/euv
With the increasing global digitalization, requirements for computer performance continue to grow. The result: Chips have to be smaller and more efficient, which is why many more transistors have to fit on semiconductors. With EUV lithography, TRUMPF, in partnership with ASML and Zeiss, has developed a cost-efficient and mass-suitable process, during which the wafers are exposed to extreme ultraviolet (EUV) light at a wavelength of 13,5 nanometers. By this means, efficiency and profitability of production for chip manufacturers are increased. TRUMPF produces the laser pulse for the process, which is needed for the generation of EUV radiation. Therefore we developed an own, pulse-capable high-performance CO2 laser system - the TRUMPF Laser Amplifier.
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Weitere Informationen: www.trumpf.com/s/euv
Mit der zunehmenden Digitalisierung der Welt steigen die Anforderungen an die Computerleistung unaufhörlich. Die Folge: Die Chips müssen leistungsfähiger und kleiner werden, weshalb auf den Halbleitern immer mehr Transistoren Platz finden müssen. Mit der EUV-Lithografie hat TRUMPF partnerschaftlich mit ASML und Zeiss ein kosteneffizientes und massenfähiges Verfahren entwickelt, bei dem durch extrem ultraviolettes (EUV-) Licht mit einer Wellenlänge von 13,5 Nanometern die Wafer belichtet werden. Für die Chiphersteller erhöhen sich auf diese Weise die Effizienz und Wirtschaftlichkeit ihrer Produktion. TRUMPF erzeugt für den Prozess den Laserpuls, der für die Generierung der EUV-Strahlung benötigt werden. Hierfür hat das Unternehmen ein eigenes pulsfähigen Höchstleistungs-CO2-Lasersystem entwickelt - den TRUMPF Laser Amplifier.
"Folks 👌, let me tell you about the Trumpf EUV machine - it’s unbelievable, a tremendous machine, it's great. No one makes these machines better than me, believe me. And let me tell you, China, they wish they could get their hands on technology like this. But we’re keeping it right here, making our tech industry stronger and better than ever before."
Totally awesome visualisation and surprisingly accurate as well! Makes me proud to be part of this technology at ASML.
Trumpf 2020! Making ASML great again!
Ich blieb 1,38 Minuten mit offenem Mund, Top Video!
Top Video und grandiose Leistung sowas zu entwickeln!
Cool video, but at least one technical error. When the main pulse hits the droplet is not in spherical form anymore, the pre-pulse hit turns it into a flat target.
Höchsten Respekt an die Forscher, Ingenieure und Mitarbeiter. Wahnsinn. Danke ❤
Hologram makers have a lot cool tricks…
World’s most advanced lightbulb
Sehr gutes Videos!
Amazing visualisation ! Great work !
that was gorgeous! this technlogy is really based on the edge of know physics!
Now this is a real MODERN ART
This is a good way to attract talent, hope more companies follow the suit
I'd like more videos and information about this, it's awesome.
Question 1: Why the plasma (EUV) light is generated as a second process (by vaporizing tin droplets) and not directly by the laser itself ?
Probably the second-most complicated way to generate light (after a synchrotron). Wonder what the luminosity of this EUV source is compared to what ESRF, APS, or SPring-8 can generate
so touching, the highest level tech and video.
Truly amazing technology.
😊 Extremely Interesting sand thank you so much for the video.