It seems that the universal stage allows both “negative” and “positive” psi offset measurement. Why is the “negative” scheme used for texture measurements? The "positive" scheme, i.e. a higher angle of incidence of the X-ray beam to the sample surface, would result in less distorted peak, right?
It seems that the universal stage allows both “negative” and “positive” psi offset measurement.
Why is the “negative” scheme used for texture measurements?
The "positive" scheme, i.e. a higher angle of incidence of the X-ray beam to the sample surface, would result in less distorted peak, right?
Wow!!