usually leaving a metal film pattern on silicon, first deposit a metal film on top of silicon substrate either PVD or CVD, then applied photo-resist on top of metal film, then define the pattern by lithography , then develop the photoresist , then etching process remove the unnecessary area , finally remove the resist film.
masks are designed generally Using CLEWIN software, later they are written on soda lime Cr coated masks, written and developed perfectly using optical direct-write lithography system (ex: upg heidelberg machine)
The first masks were done by hand and later those computers made with those hand made masks were used to make more precise masks and then those computers were used to make even more precise masks ad infinitum.. Similar to how the first ever program had to be written by manually setting the flip flops in RAM and later that program was used to write other programs by using a keyboard etc. Kind of a self bootstrapping progression
thank you very much for the video. Could you please tell me what are the reasons of the apparance of the stitching lines and why some lithography machines cause this problem and others dont cause this problem?? thank you!
printing chips with EBL is slow so it used just for making masks and prototyping but EUV used for mass production ,it shines the light and it pass trough the mask and you have the pattern in silicon wafer .
its like saying "my 3d printer can make such detailed intricate models, why does injection molding even exist," mainly because int his case, 3d printing is used for prototyping, but is far too slow and costly to mass manufacture, which is where injection molding shines because it is faster and cheaper (after you've made a certain amount of parts)
It's 2 AM and here I am learning about photolithography
Same
almost 3am ;D
Kon se branch se ho bro aur kon sa college?
Engineer
So u know how to use the sun beam
usually leaving a metal film pattern on silicon, first deposit a metal film on top of silicon substrate either PVD or CVD, then applied photo-resist on top of metal film, then define the pattern by lithography , then develop the photoresist , then etching process remove the unnecessary area , finally remove the resist film.
Its a very good information and knowledge thank you sir
Or even the specific pattern to diffract visible light. -Cloaking-
Is this also known as "direct-etch lithography", or is that something completely different?
Hewlett Packard was doing this in the early 1980s!
Great explanations, thanks! What software do you use to create these videos?
How did they developed the "resist" tool to print on the waifers in the first place?
How are the masks printed so accurately?
Using ebeam lithography to write masks
masks are designed generally Using CLEWIN software, later they are written on soda lime Cr coated masks, written and developed perfectly using optical direct-write lithography system (ex: upg heidelberg machine)
It takes forever, but its a very accurate process.
The first masks were done by hand and later those computers made with those hand made masks were used to make more precise masks and then those computers were used to make even more precise masks ad infinitum.. Similar to how the first ever program had to be written by manually setting the flip flops in RAM and later that program was used to write other programs by using a keyboard etc. Kind of a self bootstrapping progression
Easy to understand. What is used as substrate on which resist is coated? Thank you
substrate depends upon the requirement ex: MEMS SOI/ Optics Si02/ SAW filters Quartz etc.
For chips: silicon.
Thank you sir. This is very useful in such a way like me also understable.
thank you very much for the video. Could you please tell me what are the reasons of the apparance of the stitching lines and why some lithography machines cause this problem and others dont cause this problem?? thank you!
great job sir thank you very much for the great explanation
So this is how its done.
best video on lithography
Good explanation...
Thanks for the explanation🔥
how much data as byte or bits as 1x1nm squares per eletron beam writing to manufacture a whole semi disc at one "write"?
would you do a prototype (for me) starting a dvd-rom/rw drive with vacuum, electron-xray-sem and multiple ion-plasma-deposition print headers
contact my business address if interested, I'm a microelectronic IC professional developer and designer
starting with hard drive sem disc drives, clear and set operations
Song???
Nice :)
Great way to make a smart skin for a WEAV
👀👀👀 sounds like silkscreen printing tbh
I was lost in the first ten seconds! But still interesting
NIL and X-ray lithography: Am I a joke for you?
thank you so much
Good video
Brilliant
easy to understand
Wrong vid title,this is photolitography not laserbeam litography…
resist what compount is?
Most EBL resists are polymers like PMMA
So if EBL can go past 10nm why does Intel insist on EUV? Cost?
printing chips with EBL is slow so it used just for making masks and prototyping
but EUV used for mass production ,it shines the light and it pass trough the mask and you have the pattern in silicon wafer .
its like saying "my 3d printer can make such detailed intricate models, why does injection molding even exist," mainly because int his case, 3d printing is used for prototyping, but is far too slow and costly to mass manufacture, which is where injection molding shines because it is faster and cheaper (after you've made a certain amount of parts)
cool 🙂
Bruh ancient pyramid layouts n shit are obviously fucking computer chips dude . WTh . That shit all hella covered in quartz dawg
This is the one invented by China photolithography machine
Dear sir I need operational manual for elphy quantum
005
😍😘😘😍😘😍
{Lower the annoying
background musak.}
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